ASML Press Releases

ASML Announces 2011 Fourth Quarter and Full Year Results; ASML Achieves Record 2011 Sales and Sees Continued Strength in H1 2012

January 18, 2012 07:00:00

VELDHOVEN, the Netherlands, January 18, 2012 - ASML Holding NV (ASML) today publishes 2011 fourth quarter and full year results.

Tokyo Electron Limited and ASML Announce Agreement to Accelerate Joint Development Activities on EUV and Advanced Lithography Technologies

November 30, 2011 08:00:30

TOKYO, Japan/VELDHOVEN, the Netherlands, November 30th, 2011 - Tokyo Electron Limited (TEL) and ASML Holding NV (ASML) today announced an agreement to accelerate joint development activities of EUV (Extreme Ultraviolet) and ArF Immersion using state-of-the-art lithography clusters.

ASML Announces 2011 Third Quarter Results; ASML Confirms Expectation for Record Sales Year

October 12, 2011 07:00:00

VELDHOVEN, the Netherlands, Oct 12, 2011 - ASML Holding NV (ASML) today announces 2011 third quarter results.

ASML Brion Announces a New Mask Correction Capability to Enable Larger Process Windows for Advanced 2x nm Designs

September 19, 2011 08:00:00

Veldhoven, the Netherlands, September 19, 2011 - Brion Technologies, a division of ASML, today announced a new product for its popular Tachyon computational lithography platform.

ASML Announces 2011 Second Quarter Results; On Track for a Record Year 2011

July 13, 2011 07:00:00

VELDHOVEN, the Netherlands, July 13, 2011 - ASML Holding NV (ASML) today announces 2011 second quarter results according to US GAAP as follows:

ASML Enhances NXT:1950i to Meet Challenging Imaging and Overlay Requirements and Provide a Cost Effective Platform for 22nm

July 12, 2011 08:00:00

Veldhoven, the Netherlands, July 12, 2011 - ASML Holding NV (ASML) today announced three new extensions for its popular TWINSCAN NXT platform that improve imaging, overlay and productivity.

ASML Discloses Results of Annual General Meeting of Shareholders

April 20, 2011 18:30:00

VELDHOVEN, the Netherlands, April 20, 2011 - ASML Holding NV (ASML) today announces the results of its Annual General Meeting of Shareholders held on April 20, 2011.

ASML Announces 2011 First Quarter Results; Strong First Quarter Confirms Expectation for Another Record Year

April 13, 2011 07:00:00

VELDHOVEN, the Netherlands, April 13, 2011 - ASML Holding NV (ASML) today announces 2011 first quarter results according to US GAAP as follows:

ASML Publishes 2010 Annual Reports

February 15, 2011 12:00:00

VELDHOVEN, the Netherlands, February 15, 2011 - ASML Holding NV (ASML) has filed its annual report on Form 20-F for the fiscal year ended December 31, 2010 with the U.S. Securities and Exchange Commission (SEC), and has also published its Statutory Annual Report 2010 with the Dutch Authority for the Financial Markets (AFM).

ASML Provides First Update on Share Buy Back Program

January 31, 2011 08:00:00

VELDHOVEN, the Netherlands, Jan 31, 2011 - ASML Holding NV (ASML) today provides an update with additional information in connection with its share buy back program, as announced on January 19, 2011:

ASML Announces 2010 Q4 and Full Year Results, Along With Increased Dividend Proposal and Share Buy Back Program; Record backlog supports a strong 2011

January 19, 2011 07:00:00

VELDHOVEN, the Netherlands, Jan 19, 2011 - ASML Holding NV (ASML) today announces 2010 fourth quarter and full year results according to US GAAP as follows:

ASML Increases Q4 2010 Bookings Guidance

December 9, 2010 08:00:00

VELDHOVEN, the Netherlands, Dec 9, 2010 - ASML Holding NV (ASML) sees stronger than expected demand for lithography equipment, coming from most semiconductor market segments;

ASML TWINSCAN Systems Surpass 4,000 Wafers Per Day Milestone

December 1, 2010 00:00:00

Tokyo, Japan, December 1, 2010 - ASML Holding NV (ASML) today announced that two chipmakers using TWINSCAN semiconductor lithography scanners have set a new productivity record of imaging more than 4,000 silicon wafers within 24 hours.

ASML Announces 2010 Third Quarter Results; Bookings Level Confirms Strong Lithography Demand for Structural Capacity

October 13, 2010 07:00:00

VELDHOVEN, the Netherlands, Oct 13, 2010 - ASML Holding NV (ASML) today announces 2010 third quarter results according to US GAAP as follows:

ASML and Brion Unveil Software that will Optimize EUV Manufacturing of the Most Advanced Chips

September 14, 2010 08:00:00

Monterey, Calif., September 14, 2010 - Next generation semiconductor production will be facilitated by a new product introduced today by Brion Technologies, a division of ASML.

ASML Announces 2010 Second Quarter Results; Sales Set for New High Amid Increasing Semiconductor Fab Spend

July 14, 2010 07:00:00

VELDHOVEN, the Netherlands, July 14, 2010 - ASML Holding NV (ASML) today announces 2010 second quarter results according to US GAAP as follows:

Chip Makers Adopt ASML's Holistic Lithography to Continue Moore's Law

July 13, 2010 08:00:00

San Francisco, Calif., July 13, 2010 - ASML Holding NV (ASML) today at SEMICON West announces broad customer adoption of holistic lithography products which optimize semiconductor scanner performance and provide a faster start to chip production.

ASML Immersion Systems Reach 'Million Wafer Club' Status at Korean Memory Manufacturers

May 26, 2010 08:00:00

Veldhoven, the Netherlands, May 26, 2010 - ASML Holding NV (ASML) today announces that four TWINSCAN XT:1900Gi lithography systems have joined ASML's "One Million Wafer Club" of scanners that have processed more than one million silicon wafers within 12 months, underlining the importance and acceptance of this advanced technology in mainstream chip manufacturing.

ASML Announces 2010 First Quarter Results; Sustained Bookings Indicate Potential Record Revenues in 2010

April 14, 2010 07:00:00

VELDHOVEN, the Netherlands, April 14, 2010 - ASML Holding NV (ASML) today announces 2010 first quarter results according to US GAAP as follows:

ASML Discloses Results of Annual General Meeting of Shareholders

March 25, 2010 08:00:00

VELDHOVEN, the Netherlands, March 25, 2010 - ASML Holding NV (ASML) today announces the results of its Annual General Meeting of Shareholders held on March 24, 2010.

ASML Receives Intel’s Preferred Quality Supplier Award

March 3, 2010 20:30:00

VELDHOVEN, Netherlands, March 3, 2010 – ASML has been recognized as one of 16 suppliers to receive Intel Corporation’s Preferred Quality Supplier (PQS) award for their performance in 2009.

ASML FlexRay Illuminators Successfully Enter Market as Chip Makers Seek Design Flexibility for Continued Shrink

February 22, 2010 08:00:00

Veldhoven, the Netherlands, February 22, 2010 – ASML Holding NV (ASML) today announces its new FlexRay programmable illumination system is finding strong acceptance by providing chip makers with virtually unlimited illumination source tuning.

ASML Ships 100th TWINSCAN XT:19x0 Series Immersion System While Ramping Deliveries of New TWINSCAN NXT Immersion Platform

February 22, 2010 08:00:00

Veldhoven, the Netherlands, February 22, 2010 – ASML Holding NV (ASML) today announced the shipment of its 100th TWINSCAN XT:1900 series lithography system, capable of imaging industry-leading chip features as small as 38 nanometers.

TSMC to Take Delivery of an ASML EUV Lithography System for Research and Development on Future Technology Generations

February 22, 2010 01:30:00

Veldhoven, the Netherlands and Hsinchu Taiwan, R.O.C. - February 22, 2010 - ASML Holding NV (ASML) today announced that Taiwan Semiconductor Manufacturing Company (TWSE: 2330, NYSE: TSM) will take delivery of a TWINSCAN NXE:3100 extreme ultra-violet (EUV) lithography system.

ASML Publishes 2009 Annual Report

January 29, 2010 15:00:00

VELDHOVEN, the Netherlands, January 29, 2010 - ASML Holding NV (ASML) has filed its annual report on Form 20-F for the fiscal year ended December 31, 2009 with the U.S. Securities and Exchange Commission (SEC).

ASML Announces 2009 Fourth Quarter and Full Year Results; Rise in Bookings Confirms Strong 2010 First Half Year

January 20, 2010 07:00:00

VELDHOVEN, the Netherlands, January 20, 2010 - ASML Holding NV (ASML) today announces 2009 fourth quarter and full year results according to US GAAP as follows:

ASML and Brion Technologies Extend Partnership with STMicroelectronics for Integrated Lithography Solutions for Advanced Chip Development

December 3, 2009 08:00:00

Veldhoven, the Netherlands, December 3, 2009 - ASML, along with its subsidiary Brion Technologies, today announced a broad-scoped joint development project with STMicroelectronics (ST) to accelerate 28-nm node deployment and 22-nm node development.

Chartered Adopts Brion's Computational Lithography Solutions

November 2, 2009 08:00:00

SANTA CLARA, Calif., November 2, 2009 - Brion Technologies, an ASML company, has reached a multi-year agreement with Chartered Semiconductor Manufacturing Ltd., one of the world's top dedicated semiconductor foundries, to implement a broad suite of computational lithography products.

ASML Announces 2009 Third Quarter Results; Sales and Orders Rise as Chip Industry Executes Technology Investment Strategy

October 14, 2009 07:00:00

VELDHOVEN, the Netherlands, October 14, 2009 - ASML Holding NV (ASML) today announces 2009 third quarter results according to US GAAP as follows:

ASML Announces Appointment of New COO to the Board of Management

September 24, 2009 08:00:00

VELDHOVEN, the Netherlands, September 24, 2009 - ASML Holding NV (ASML) today announces that the Supervisory Board intends to appoint Frederic Schneider-Maunoury as Executive Vice President and Chief Operating Officer (COO) to the Board of Management, subject to notification of the general meeting of shareholders which is scheduled to be held on March 24, 2010.

ASML Reports Improving Business Trend

September 10, 2009 08:00:00

VELDHOVEN, the Netherlands, September 10, 2009 - ASML Holding NV (ASML) today reports a business pick-up above previous guidance resulting mainly from the short- and mid-term needs in the DRAM memory and Logic segments.

ASML Publishes Statutory Interim Report for 2009 First Six Months

July 24, 2009 08:00:00

VELDHOVEN, the Netherlands, July 24, 2009 - ASML Holding NV (ASML) today published its Statutory Interim Report for the six-month period ended June 28, 2009.

ASML Announces 2009 Second Quarter Results; Semiconductor Industry Resumes Lithography Technology Transition Purchases

July 15, 2009 07:00:00

VELDHOVEN, the Netherlands, July 15, 2009 - ASML Holding NV (ASML) today announces 2009 second quarter results according to US GAAP as follows:

ASML Brion Reaches Computational Lithography Agreement with Toshiba Corporation

July 14, 2009 17:00:00

San Francisco, Calif., July 14, 2009 - Brion Technologies has reached a preferred supplier agreement with Toshiba Corporation to implement a comprehensive suite of computational lithography products for Toshiba's 3X nm and 2X nm node devices.

ASML Introduces Holistic Lithography Solutions to Continue Moore’s Law

July 14, 2009 17:00:00

San Francisco, Calif., July 14, 2009 - ASML Holding NV (ASML) today unveils at SEMICON West new lithography products that allow chipmakers to continue to shrink features on semiconductors. As part of ASML's Holistic Lithography vision, FlexRay^TM programmable illumination and BaseLiner^TM scanner stability optimize and stabilize manufacturing process windows.

ASML and Cymer Announce Advancement in EUV to Enable Manufacturing of Integrated Circuits for Years to Come

July 13, 2009 17:00:00

VELDHOVEN, the Netherlands/ SAN DIEGO, United States, July 13, 2009 - ASML (Nasdaq: ASML) and Cymer, Inc. (Nasdaq: CYMI) formally announce the shipment of the world’s first fully integrated laser-produced plasma (LPP) Extreme Ultraviolet (EUV) lithography source to ASML.

ASML announces 2009 First Quarter Results; In a very Difficult Quarter ASML Generates Cash and Prepares for Pick-up of Technology Purchases

April 15, 2009 07:00:00

VELDHOVEN, the Netherlands, April 15, 2009 - ASML Holding NV (ASML) today announces 2009 first quarter results according to US GAAP as follows:

ASML Discloses Results of Annual General Meeting of Shareholders

March 27, 2009 08:00:00

VELDHOVEN, the Netherlands, March 27, 2009 - ASML Holding NV (ASML) today announces the results of its Annual General Meeting of Shareholders held on March 26, 2009.

ASML Publishes 2008 Annual Report

January 26, 2009 13:30:00

VELDHOVEN, the Netherlands, January 26, 2009 - ASML Holding NV (ASML) has filed its annual report on Form 20-F for the fiscal year ended December 31, 2008 with the U.S. Securities and Exchange Commission (SEC).

ASML Supervisory Board Nominates Wolfgang Ziebart as New Member

January 21, 2009 08:00:00

VELDHOVEN, the Netherlands, January 21, 2009 – The Supervisory Board of ASML Holding NV (ASML) is pleased to announce it will nominate Mr. Wolfgang Ziebart for appointment as a member of its Supervisory Board by the Annual General Meeting of Shareholders, which is scheduled to be held on March 26, 2009.

ASML Announces 2008 Fourth Quarter and Full Year Results; ASML Drives Key Technology Developments and Implements a More Effective Cost-structure During Downturn

January 15, 2009 07:00:00

VELDHOVEN, the Netherlands, January 15, 2009 - ASML Holding NV (ASML) today announces 2008 fourth quarter and full year results according to US GAAP as follows:

ASML Takes Action to Adjust Its Organization Due to Severe Order Slowdown

December 18, 2008 08:00:00

VELDHOVEN, the Netherlands, December 18, 2008 - ASML Holding NV (ASML) announces today that it has seen a severe deterioration in its order intake due to the global economic crisis.

ASML Launches the TWINSCAN NXT:1950i Immersion Lithography System Enabling Faster and More Accurate Chip Production at Leading-edge Resolutions

December 2, 2008 23:00:00

Tokyo, Japan, December 3, 2008 – ASML Holding NV (ASML) today announces at SEMICON Japan the first system based on its new TWINSCAN NXT lithography platform.

ASML and Brion Bring Computational Lithography to the Fab

December 2, 2008 23:00:00

Tokyo, Japan, December 3, 2008 — ASML and its subsidiary Brion Technologies today announce LithoTuner™, a new suite of products that integrates computational and wafer lithography to improve semiconductor manufacturability.

ASML Sets Productivity Records Across the Spectrum of TWINSCAN Models; Establishes New Standards of Semiconductor Manufacturing Capability

November 19, 2008 08:00:00

VELDHOVEN, the Netherlands – November 19, 2008 – ASML Holding NV (ASML) today announces that productivity records have been set by its TWINSCAN™ platform of lithography systems.

ASML Announces Changes to the Board of Management; Klaus Fuchs to Resign as EVP Operations, Frits van Hout to Join the Board

October 30, 2008 08:00:00

VELDHOVEN, the Netherlands, October 30, 2008 - ASML Holding NV (ASML) today announces that Klaus Fuchs, Executive Vice President Operations, has confirmed to the Supervisory Board that he has decided to resign from his position on the Board of Management effective January 1, 2009.

ASML’s New TWINSCAN NXT Immersion Lithography Platform Brings Overlay and Productivity Breakthroughs to Power Next Phase of Semiconductor Manufacturing

October 15, 2008 11:00:00

VELDHOVEN, the Netherlands, October 15, 2008 – ASML Holding NV (ASML) today unveiled innovations in its TWINSCANTM lithography platform that offer significant improvements in overlay and productivity, enabling the semiconductor industry to continue its roadmap for more advanced and affordable chips.

ASML Announces 2008 Third Quarter Results; ASML Addresses Weak Market with Lower Costs and Strong Product Line-up

October 15, 2008 07:00:00

VELDHOVEN, the Netherlands, October 15, 2008 - ASML Holding NV (ASML) today announces 2008 third quarter results according to US GAAP as follows:

ASML Updates Industry on Significant Progress in EUV Lithography Program; Reveals Roadmap that Extends Semiconductor Manufacturing to 11 Nanometers and Beyond

September 30, 2008 08:00:00

Lake Tahoe, California, USA, September 30, 2008 – ASML Holding NV (ASML) presents today at the 2008 International Symposium on Extreme Ultraviolet Lithography (EUV) on recent achievements in its EUV lithography program and unveils a production system roadmap that supports cost-effective chip manufacturing to at least 11 nanometers (nm).

ASML Supervisory Board Nominates Pauline van der Meer Mohr as New Member

September 12, 2008 08:00:00

VELDHOVEN, the Netherlands, September 12, 2008 – The Supervisory Board of ASML Holding NV (ASML) is pleased to announce it will nominate Mrs. Pauline van der Meer Mohr for appointment as a member of its Board by the Annual General Meeting of Shareholders, which is scheduled to be held on March 26, 2009.

ASML Announces 2008 Second Quarter Results; Immersion Technology Growth Continues amid Macro-economic Pressure

July 16, 2008 07:00:00

VELDHOVEN, the Netherlands, July 16, 2008 - ASML Holding NV (ASML) today announces 2008 second quarter results according to US GAAP as follows:

ASML Extends Immersion to the Limit of Single-Patterning Lithography; New TWINSCAN XT:1950i Offers 25 Percent Performance Improvement and Enables World-leading Sub 40 nm Volume Chip Imaging

July 15, 2008 08:00:00

VELDHOVEN, the Netherlands, July 15, 2008 – ASML Holding NV (ASML) announces today its newest TWINSCANTM XT:1950i lithography system using a 1.35 NA lens – increasing the performance of its immersion lithography systems by 25%.

Rolf Deusinger Resigns from ASML Supervisory Board

June 6, 2008 08:00:00

VELDHOVEN, the Netherlands, June 6, 2008 - ASML Holding NV (ASML) announces that Rolf Deusinger has decided to resign with immediate effect from the Supervisory Board.

ASML Ships 1000th KrF Lithography System; Milestone Confirms KrF Leadership in Productivity and System Extendibility

April 22, 2008 09:00:00

VELDHOVEN, the Netherlands, April 22, 2008 - ASML Holding NV (ASML) today announces that it has shipped its 1000th KrF lithography system.

ASML Announces 2008 First Quarter Results; ASML Continues to Execute its Leadership Strategy, Expects Gradual Order Pick-up

April 16, 2008 07:00:00

VELDHOVEN, the Netherlands, April 16, 2008 - ASML Holding NV (ASML) today announces 2008 first quarter results according to US GAAP as follows:

ASML Discloses Results of Annual General Meeting of Shareholders

April 3, 2008 18:45:00

VELDHOVEN, the Netherlands, April 3, 2008 - ASML Holding NV (ASML) today announces the results of its Annual General Meeting of Shareholders held on April 3, 2008.

ASML Chief Executive Officer Eric Meurice Accepts Extension of Contrac

March 3, 2008 08:00:00

VELDHOVEN, the Netherlands, March 3, 2008 - ASML Holding NV (ASML) announces that its Supervisory Board has agreed with Chief Executive Officer (CEO) Eric Meurice to extend his contract.

ASML Initiates Dividend Payments, Starting with EUR 0.25 per Share over 2007

February 19, 2008 08:00:00

VELDHOVEN, the Netherlands, February 19, 2008 - ASML Holding NV (ASML) today announces its intent to initiate dividend payments, starting with a pay-out proposal of EUR 0.25 per ordinary share over 2007, which will be put to a vote at ASML’s annual general meeting (AGM) of shareholders in Veldhoven, on April 3, 2008.

ASML Publishes 2007 Annual Report

January 25, 2008 22:15:00

VELDHOVEN, the Netherlands, January 25, 2008 – ASML Holding NV (ASML) today filed its annual report on Form 20-F for the fiscal year ended December 31, 2007 with the U.S. Securities and Exchange Commission (SEC).

ASML Completes its Share Buyback Program

January 23, 2008 08:00:00

VELDHOVEN, the Netherlands, January 23, 2008 - ASML Holding NV (ASML) today announced completion of its share buyback program disclosed on October 17, 2007 as follows:

Strong Q4 Leads ASML to Record 2007 Full Year Earnings; Technology Leadership to Provide Robust H1 Sales and Profit Amid Market Uncertainty

January 16, 2008 07:00:00

VELDHOVEN, the Netherlands, January 16, 2008 - ASML Holding NV (ASML) today announces 2007 fourth quarter and 2007 full year results according to US GAAP as follows:

ASML, Zeiss and Canon Cross-license Lithography Equipment Patent Portfolios

December 21, 2007 08:00:00

VELDHOVEN, the Netherlands/OBERKOCHEN, Germany, December 21, 2007 - ASML Holding NV (ASML) and Carl Zeiss SMT (Zeiss) today announce that each has signed an agreement with Canon Inc. (Canon) for the global cross-license of patents in their respective fields of semiconductor lithography and optical components, used to manufacture integrated circuits, or chips.

Early Success of the TWINSCAN XT:1900i Scanner Reinforces ASML’s Immersion Leadership Around the World

December 4, 2007 23:00:00

TOKYO, SEMICON Japan 2007, December 05, 2007 – ASML Holding NV (ASML) today announces rapid industry adoption of the TWINSCAN™ XT:1900i, which began shipping in July 2007.

ASML Issues Update of Share Buyback Program Announced on October 17

November 27, 2007 08:00:00

VELDHOVEN, the Netherlands, November 27, 2007 – ASML Holding NV (ASML) today announces progress in connection with its share buyback program disclosed on October 17, 2007 as follows:

ASML Starts Execution of Share Buyback Program Announced on October 17

November 20, 2007 08:00:00

VELDHOVEN, the Netherlands, November 20, 2007 – ASML Holding NV (ASML) today announces progress in connection with its share buyback program disclosed on October 17, 2007 as follows:

ASML Updates Market on long-term Semiconductor Lithography Opportunities; Lithography Market Potential Above EUR 10 Billion by 2012

November 2, 2007 08:00:00

VELDHOVEN - November 2, 2007 - ASML Holding NV (ASML) today, in a meeting with financial analysts and investors, recognizes a potential for the global semiconductor lithography market to grow to above EUR 10 billion by 2012 from EUR 5 billion in 2006, supporting annual growth for the lithography market of 13 percent on average.

ASML Announces 2007 Third Quarter Results; Strong Demand for Latest Chip Litho Systems Prompts Solid Outlook

October 17, 2007 07:00:00

VELDHOVEN, the Netherlands, October 17, 2007 - ASML Holding NV (ASML) today announces 2007 third quarter results according to US GAAP as follows:

ASML Confirms Record Date for Capital Repayment and Reverse Stock Split

September 25, 2007 08:00:00

VELDHOVEN, the Netherlands, September 25, 2007 – ASML Holding NV (ASML) today confirmed that none of its creditors has opposed the capital repayment and/or reverse stock split.

ASML i-Line Scanners Achieve New Level of Productivity Taiwanese Customer Processes Record 3,596 wafers in Single Day

September 12, 2007 08:00:00

TAIPEI, Taiwan – SEMICON Taiwan 2007 – Sept 12, 2007 – ASML Holding NV (ASML) today announced that a Taiwanese customer using its TWINSCAN™ i-Line scanners has achieved an unprecedented level of 300mm productivity by processing 150 wafers per hour for 24 hours, reaching a record output of 3,596 wafers in a single day.

ASML Announces Timing for Capital Repayment and Reverse Stock Split

August 29, 2007 08:00:00

VELDHOVEN, the Netherlands, August 29, 2007 – ASML Holding NV (ASML) today announced that, subject to the condition that creditors have not opposed the capital repayment, it has set a record date for the repayment of EUR 2.04 per ordinary share and the consolidation of all outstanding ordinary shares (the reverse stock split) as approved at its Extraordinary General Meeting of Shareholders on July 17, 2007.

ASML Announces 2007 Second Quarter Results; Product Breakthrough Reinforces Market Leadership, Order Intake Set to Rise

July 18, 2007 07:00:00

VELDHOVEN, the Netherlands, July 18, 2007 - ASML Holding NV (ASML) today announced 2007 second quarter results according to US GAAP as follows: