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Key Features and Benefits
Variable 0.93-NA 248-nm Projection Lens
In-line catadioptric lens design with advanced lens manipulators, supporting full 26x33-mm field, 4X reduction and reticle compatibility with existing refractive designs.
AERIAL-E Illuminator
Enables continuous-variable conventional and off-axis illumination with an extended zoom maintaining high throughput.
Superior Overlay
The XT:1000H is equipped with the latest overlay improvements resulting in single machine overlay of < 6 nm and matched machine overlay of < 10 nm.
LithoGuide ILIAS
Very accurate system set-up and sophisticated monitoring of imaging parameters.
High-Speed Dual-Stage Technology
Industry leading throughput for high volume manufacturing enabling highest number of good wafers per day.
40-W KrF Laser Technology With Frequency Control
The perfect combination of high laser power for high throughput and efficient use of laser pulses for the lowest possible laser cost of operation.
| Lens | Field Size | Overlay | Throughput | |
|---|---|---|---|---|
| NA | Resolution | X & Y | 16-point Alignment | 300 mm Wafers 125 Exp., 50 mJ/cm2 |
| Variable 0.5 to 0.93 | < 80 nm | 26 X 33 mm | < 6 nm | > 165 wph |