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| Lithography
TWINSCAN |
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| The TWINSCAN XT:870G 248-nm Step-and-Scan system is a high-productivity,
dual-stage KrF lithography tool designed for volume 300-mm wafer production at
and below 110-nm resolution. Combining the imaging power of a variable
0.55-0.80-NA Carl Zeiss Starlith 870 4X reduction lens with AERIAL II and the
optional QUASAR XL Illuminator technology, the XT:870G extends volume-proven KrF
technology to 100-nm applications. Highly line-narrowed 30-W KrF lasers with
variable frequency control, in combination with the high optical transmission of
the optical system, provide a production throughput of 150 300-mm wph with the
lowest possible cost of operation. |
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Key Features and Benefits
Variable 0.80-NA 248-nm 870 Projection Lens
Very low aberration levels. Extremely tight focal plane and distortion control.
AERIAL II Illuminator
Enables continuous-variable conventional and off-axis illumination with zoom optics for maintaining high throughput.
LithoGuide ILIAS
Very accurate system set-up. Monitoring of imaging parameters.
High-Speed Dual-Stage Technology
Provides industry-leading throughput over a wide range of resist sensitivities.
30-W KrF Laser Technology With Variable Laser Frequency Control
The perfect combination of high laser power for high throughput and efficient use of laser pulses for the lowest possible laser cost of operation. |
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| Lens | Field Size | Overlay | Throughput |
| NA | Resolution | X & Y | 16-point
Alignment | 300 mm Wafers
125 Exp., 50 mJ/cm2 |
Variable
0.55 to 0.80 | < 110 nm | 26 X 33 mm | < 6 nm* | > 150 wph |
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| * Single machine overlay includes TOP package |
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