ASML MaskTools’ LithoCruiser is the industry’s only integrated software suite for low k1 lithography optimization. LithoCruiser simulates, analyzes and optimizes the most advanced ASML scanner performance and mask design simultaneously. It can be easily used to develop new lithography processes and optimize existing processes at the design, photomask and imaging levels.
LithoCruiser is tightly integrated with ASML’s leading edge scanners, enabling relevant information such as actual illumination profiles to be used in the analysis and optimization of wafer imaging performance. LithoCruiser is targeted for use by lithography technology development organizations of semiconductor manufacturers.
Process Analyzer
NA/Sigma Optimizer
OPC Optimizer
Pupil Optimizer
Key Benefits
Complete Low k1 Solution Path LithoCruiser enables users to develop, characterize and optimize the entire pre-production process, from mask design to wafer imaging--without producing a single mask or exposing a single wafer
Scanner & Mask Optimization Several powerful functions are offered for automatic optimization of NA/sigma, illumination and OPC. Optimization is performed by taking into account ASML scanner boundary conditions, thus producing manufacturable results.
Highly Accurate and Tunable Resist Models LithoCruiser includes the most advanced 3D LPM and “full physical” resist models, which can be calibrated through focus and exposure, providing highly accurate process analyses and optimized settings.
Ease of Use State-of-the-art graphical user-interface (GUI) allows intuitive entry of process parameters and provides easy access to lithography process actions
Open Access Platform Powerful Applications Programming Interface (API) enables users to build their own customized set of analysis and optimization applications.
