ASML designs, develops and manufactures equipment used to transfer circuit patterns onto wafers. ASML constantly improves this process by continually shrinking line widths (reduced resolution or feature size), thereby enabling customers to cut the size or add more functionality to future generations of ICs. Finer widths allow electricity to move across the chip faster, boosting the chip's performance.
ASML's systems have exposure wavelengths that vary from 365 nm, 248 nm to 193 nm, and soon will incorporate extreme ultraviolet (EUV). ASML is committed to making the necessary advancements to propel the lithography business into the future.