The PAS 5500/1150C 193-nm Step-and-Scan system enables cost effective 90-nm ArF mass production.
The PAS 5500/1150C is the solution for both 90-nm critical and non critical ArF layers. The PAS 5500/1150C can be configured with a number of options that enable low-k₁ in manufacturing, extending application of the PAS 5500/1150C below 90 nm.

Lens

• Max X:

  26.0 mm

• Max Y:

  33.0 mm

• BF:

  ≤ 7 nm

• Over 0.3-μm defocus:

  ≤ 10 nm

• BF:

  ≤ 6 nm

• Over 0.2-μm defocus:

  ≤ 9 nm

• Annular:

  ≤ 12 nm

Overlay

Production Throughput

• 200-mm wafers, 46 shots:

  ≥ 135 wph

AERIAL II Illumination

• σ max:

  0.88

• σ min:

  0.33

• Intensity:

  ≥ 1100 mW/cm² (@ NA Max)

• σ out:

  0.40–0.89

• σ in:

  0.16–0.64

• Integrated slit uniformity:

  ≤ 0.6%

Lasers

Variable 0.75-NA 193-nm Projection Lens with Advanced Lens Manipulators

Production resolution down to 90 nm.

AERIAL II Illuminator

Provides the ultimate flexibility in illumination modes at maximum throughput.

PAS 5500 Step-and-Scan Body

Commonality with i-line and KrF Step-and-Scan tools for economic mix-and-match.

ATHENA Advanced Alignment Combined With Reticle Blue Align

Increased alignment accuracy for a wide variety of processes.
Ultra stable over time.

20-W ArF Laser With Variable Laser Frequency Control

High power 4-kHz laser enabling maximum throughput over a large dose range.

Batch Streaming With ARMS

Continuous-flow manufacturing.

Image Streaming Package

For enhanced productivity.