ASML is the world's leading provider of lithography systems for the semiconductor industry. Headquartered in Veldhoven, the Netherlands, ASML employs more than 7,000 people.
The PAS 5500/1150C 193-nm Step-and-Scan system enables cost effective 90-nm ArF mass production.
The PAS 5500/1150C is the solution for both 90-nm critical and non critical ArF layers. The PAS 5500/1150C can be configured with a number of options that enable low-k1 in manufacturing, extending application of the PAS 5500/1150C below 90 nm.
|Resolution:||≤ 90 nm|
|Single-machine:||≤ 12 nm|
|Matched-machine:||≤ 20 nm|
Production Throughput20-mJ/cm2 exposure dose
AERIAL II IlluminationConventional
|Type:||Cymer Nanolith 7600A|
|Beam Delivery:||≤ 20-m remote capability|
Variable 0.75-NA 193-nm Projection Lens with Advanced Lens Manipulators
Production resolution down to 90 nm.
AERIAL II Illuminator
Provides the ultimate flexibility in illumination modes at maximum throughput.
PAS 5500 Step-and-Scan Body
Commonality with i-line and KrF Step-and-Scan tools for economic mix-and-match.
ATHENA Advanced Alignment Combined With Reticle Blue Align
Increased alignment accuracy for a wide variety of processes.
Ultra stable over time.
20-W ArF Laser With Variable Laser Frequency Control
High power 4-kHz laser enabling maximum throughput over a large dose range.
Batch Streaming With ARMS
Image Streaming Package
For enhanced productivity.