ASML is the world's leading provider of lithography systems for the semiconductor industry. Headquartered in Veldhoven, the Netherlands, ASML employs more than 7,000 people.
The TWINSCAN XT:1950Hi Step-and-Scan system takes single-exposure water-based immersion lithography to its limits. Combining high productivity with ultra low-k1, this dual-stage immersion lithography tool is designed for volume production on 300-mm wafers at 38-nm resolution and beyond.
Building on the successful in-line catadioptric lens design concept first employed in the XT:1700Fi, the XT:1950Hi has a numerical aperture (NA) of 1.35 – the highest in the industry. This compact and mechanically stable lens design has the same image orientation as purely refractive lens designs, ensuring full reticle compatibility with non-immersion systems as well as the XT:1700Fi. Optional additional control features improve lens stability and aberration control further.
The illuminator features polarization at maximum throughput and extremely homogeneous pupil fill, making it perfectly adapted to ultra low-k1 pupil shapes. Customized illumination modes for ultra low-k1 and rotated structures can also be set. In addition to its polarization capabilities, the system comes equipped with an extended Ultra-k1 package comprising QUASAR XL, LithoGuide ILIAS, DoseMapper, Reticle Shape Correction, CDFEC and Focus Spot Monitor.
Complementing its enhanced resolution, the XT:1950Hi delivers excellent overlay, CD uniformity and focus performance.
|Resolution:||≤ 38 nm|
|Single-machine:||≤ 4 nm|
|Matched-machine:||≤ 7 nm|
Production Throughput30-mJ/cm2 exposure dose
1.35-NA 193-nm Catadioptric Projection Lens
Production resolution down to 40 nm (C-quad) and 38 nm (dipole). In-line catadioptric lens design, supporting full 26 x 33-mm field, 4X reduction and reticle compatibility with existing lens designs. Optional additional control systems further improve imaging stability.
Dual-Stage Immersion Technology
Dual-stage operation with high-speed closing disk supports continuous water flow during stage swap with minimum overhead. Highest immersion throughput at maximum stability. Improved immersion hood concept increases immersion meniscus stability and robustness, and reduces susceptibility to contamination.
AERIAL XP Polarized Illuminator
Extends range of conventional and off-axis illumination. Polarization significantly reduces the mask error factor, and can increase the resolution by up to 5 nm at maximum throughput.
6-kHz ArF Laser Technology
High laser power for high throughput. Efficient use of laser pulses minimizes laser operating costs and optimizes dose performance. Laser is equipped with novel gas lifetime extensions to reduce downtime.