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TWINSCAN XT:1950Hi

193-nm Step and Scan

  • 1.35-NA 193-nm Catadioptric Projection Lens
  • Dual-Stage Immersion Technology
  • AERIAL XP Polarized Illuminator
  • 6-kHz ArF Laser Technology

The TWINSCAN XT:1950Hi Step-and-Scan system takes single-exposure water-based immersion lithography to its limits. Combining high productivity with ultra low-k1, this dual-stage immersion lithography tool is designed for volume production on 300-mm wafers at 38-nm resolution and beyond.

Building on the successful in-line catadioptric lens design concept first employed in the XT:1700Fi, the XT:1950Hi has a numerical aperture (NA) of 1.35 – the highest in the industry. This compact and mechanically stable lens design has the same image orientation as purely refractive lens designs, ensuring full reticle compatibility with non-immersion systems as well as the XT:1700Fi. Optional additional control features improve lens stability and aberration control further.

The illuminator features polarization at maximum throughput and extremely homogeneous pupil fill, making it perfectly adapted to ultra low-k1 pupil shapes. Customized illumination modes for ultra low-k1 and rotated structures can also be set. In addition to its polarization capabilities, the system comes equipped with an extended Ultra-k1 package comprising QUASAR XL, LithoGuide ILIAS, DoseMapper, Reticle Shape Correction, CDFEC and Focus Spot Monitor.

Complementing its enhanced resolution, the XT:1950Hi delivers excellent overlay, CD uniformity and focus performance.

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