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Chemistry at ASML

Push technological boundaries on every possible front

Come and join us

How to apply

What to expect

Check it out

Our next-generation lithography systems use Extreme UltraViolet (EUV) radiation with a wavelength of just 13.5nm - this creates IC features of just 5nm. But when EUV hits photoresist, complex chemistry releases quite a few unwanted molecules: 2.0E14/cm^2 per second to be exact. And it's our chemistry engineers' job to ensure that these molecules don't build up on the systems optics and render a multi-million Euro machine useless. It's just one of the groundbreaking challenges you could be handling at ASML.

Making new breakthroughs
You could be analyzing TXRF, Raman FTIR or SEM/EDX results to understand the surface condition of a part and see what happens upon prolonged exposure to ultra-pure water. Or, if you are into photochemistry, you could be working with resist suppliers, helping them to develop new photo-reactive materials fit for use in tomorrow's lithography systems. You could find a way to keep particles from being generated or transported, or develop new methods for cleaning immersion systems with minimal downtime and without damaging the delicate optics or other system components.


Check our vacancies


Put your chemistry skills to work
Put your general chemistry skills and knowledge to the test as a member or leader of one of our multidisciplinary teams. You will help design complete high-tech systems, you'll get involved in modeling thermo-chemical processes and work with experts - within ASML and outside, in your own field and others. 



Page updated on 2016-8-11 11:20 CEST

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