10 days ago - req20278

CS- Techn.Dev.Center Senior Manager - Hsinchu

Research & development

Mechanical engineering

In a nutshell

Location

Hsinchu, Taiwan

Team

Research & development

Experience

8+ years

Degree

Master

Job Category

Mechanical engineering

Travel

30%

Introduction

How far will the Lithography go? Will the Moore’s law keep going?It is a right place to develop lithography technology to make Moore’s lawgoing further.

Job Mission

Next to 0.33NA EUVL, we will make 0.55NA system keepingsemiconductor industry on the road of continuous dimension shrinkage for ICdesign.

Job Description

Based on node evolution tracks and IC fabrication processrequirements for the upcoming generations, what the patterning performances of0.55NA system will fulfill technology requirements for the generations of2nm, 1.4nm, 1.0nm and beyond.

Education

Masterand above

Experience

15 years +

Personal skills

• Lithography process developments for a new generation
• Design rule co-optimized with process capability
• OVL assessments, Pattern fidelity verifications andcorrections, Process performance budget analysis and breakdown

Context of the position

We are facing the device architecture changed from FinFET to GAAand lithography technology advanced from immersion to EUV. Continuouslyenhancing lithography capabilities are big challenges to fulfill angstromlevel process control to achieve high computing performance devices for cloudAI era and low power consumption wearable devices for IoT world.