30 days ago - req29189

Senior e-Beam Metrology Application Product Engineer

Research & development

Electrical engineering

Computer science & software engineering

Physics

In a nutshell

Location

San Jose - CA, US

Team

Research & development

Experience

3-7 years

Degree

Master

Job Category

Electrical engineering, Computer science & software engineering, Physics

Introduction

ASML US brings together the most creative minds in science and technology to develop lithography machines that are key to producing faster, cheaper, more energy-efficient microchips. We design, develop, integrate, market and service these advanced machines, which enable our customers - the world’s leading chipmakers - to reduce the size and increase the functionality of their microchips, which in turn leads to smaller, more powerful consumer electronics. Our headquarters are in Veldhoven, the Netherlands, and we have 18 office locations around the United States including main offices in Chandler Arizona, San Jose and San Diego California, Wilton Connecticut, and Hillsboro Oregon.

Job Mission

As Senior Metrology Application Product Engineer, your mission is to specify, design, realize and verify product design of e-beam based Overlay Metrology Application.This role also requires to conduct system level feasibility studies.

Job Description

As a senior or principal engineer, you will be responsible for the followings –

·Define requirements for new overlay (OVL) metrology application based on a scanning electron microscope.

·Deliver functional specification (EPS), test specification (TPS), design specification (EDS), qualification document (TAR) and other documentations for overlay metrology application related functionalities, including recipe optimization, image acquisition and processing, analytics and results reporting and review.

·Develop algorithm for SEM image processing, such as object detection.

·Develop image alignment methodologies (D2DB, D2D alignment).

·Develop techniques of enhancing image quality.

·Develop machine learning/deep learning based algorithms to argument application performance.

·Define and execute test plan of new overlay metrology application.

A good candidate should be capable of prototyping ideas, performing feasibility studies, and collaborating with the software development (R&D) team.

Education

Ph.D. or M.S. in Computer Science, Electrical Engineering, Physics, Applied Mathematics, or related areas.

Experience

·Minimal 2-3 years of research or hand-on development experience in image processing or related areas

·Minimal 2-3 years of hand-on experience in recipe optimization for SEM or its applications.

·Experience in machine learning/deep learning techniques are a plus

·Any knowledge in lithography, IC design and metrology is a good plus.

Personal skills

  • Ability to work independently and also effectively as a member of a team
  • Be able to handle multiple tasks
  • Excellent written and verbal communication skills, in a multi-cultural environment
  • Strong problem solving and innovative thinking skills
  • Quick learner and flexibility

Context of the position

This position primarily works in an office environment. It requires frequent sitting, standing and walking. Daily use of a computer is required. May stand for extended periods when facilitating meetings. The physical demands of the position described herein are essential functions of the job and employees must be able to successfully perform these tasks for extended periods. Reasonable accommodations may be made for those individuals with real or perceived disabilities to perform the essential functions of the job described.

Other information

EOE AA M/F/Veteran/Disability

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