Referral candidates: Optical Engineers
Research & Development
In a nutshell
Research & Development, Design Engineering
Please be aware that you can only apply for this position if you were referred by an ASML employee.
We need your help to make ASML grow!
ASML Optics provides unsurpassed optical manufacturing capacity with complete Design-to-Image services for your most demanding optical applications. From components to entire systems, ASML Optics can provide the solution as an extreme-precision optics supplier.
Enjoy perfecting ultra-extreme-precision optics systems
Why working in ASML optics is the ideal job for you:
- Discover and invent
- More than ray tracing
- Extremely short wavelength
Imagine perfecting an optical system where aberrations are kept to within one thousandth of the wavelength used. One where 200kg reflectors must be positioned to within an accuracy of less than one nanometer. And then repositioned every second to compensate for millikelvin fluctuations.Imagine using a sensitivity matrix with multiple thousands of elements to calculate how to reposition those mirrors. And imagine working with a highly motivated team, dedicated to perfecting this extreme-precision instrumentation and optical system.If you enjoy working at (and beyond) the edge of what is possible in optics, ASML is your ideal environment.
What are the requirements?
We are looking for experience in the optical field. Please note that you will only be considered for this vacancy if you meet the following requirements.
0 - 2 years of working experience. An educational background in Physics/Optics other technical education (Electronics, Mechanical engineering, Mechatronics, Aerospace engineering, etc) , with shown affinity in optics. Shown experience in optical design or optical experimental set ups.
Professionals: Work experience in Optical Engineering
Optics at ASML
ASML is the world's leading provider of lithography systems for the semiconductor industry. Our machines use Deep Utraviolet (DUV) and Extreme Ultraviolet (EUV) light which have 193 and 13.5 nm wavelengths respectively. The necessary degree of control accuracy is so extreme and the instrumentation needed to enable that control is so complex, that ASML optics engineers need expertise in many other fields. Colleagues in physics, mechatronics, electronics, software, thermal engineering and dynamics all share their knowledge to help each other innovate.
Discover and Invent
The optics in an ASML lithography machine must be controlled extremely accurately – to within a nanometer, in fact. Hence, the projected beam will be affected by many different parameters. It will be your job to understand how vibration, temperature fluctuation, chemical contamination and more affect the projection of Extreme Ultraviolet (EUV) and Deep Ultraviolet (DUV) light. And it will be your job to invent ways to prevent and/or compensate for those parameter changes. Hence you will develop a holistic knowledge of the entire machine – not just its optics. And since these machines are possibly the most complex ever imagined, this is a discovery opportunity like no other.
More than ray tracing
Optics engineering at ASML goes beyond the capabilities of ray tracing (a technique that mathematically identifies and reproduces the path of a light ray). At ASML, optics engineers use ZEMAX and MATLAB and manipulate sensitivity matrices with over 300 degrees of freedom. They stay involved in the implementation of the optical design in hardware and control algorithms, all the way up to the successful application in the system in a customer fab.
Extremely short wavelength
EUV lithography uses a wavelength of just 13.5 nm, and this has its own exotic challenges such as researching how this light reacts to all the different materials in and around the optical path. In addition, because the wavelength is so short, all optical surfaces have to be 1-2 orders of magnitude more accurate than optics at more conventional wavelengths, in order to get the same level of imaging quality. On top of all that, EUV light has to travel in vacuum, as it would be absorbed by air or other gases. In our projection optics we have to be able to control and manipulate the wavefront of the EUV light in order to be able to nm-accurately project it on the right spot on the wafer.