Brion Technologies

Brion Technologies, which joined ASML in 2007, completed a key piece of the holistic lithography puzzle with its software technology and product portfolio

History of Brion

From Silicon Valley startup to a part of ASML’s global product portfolio, Brion Technologies has grown – and certainly evolved – tremendously since it was founded in 2002.

Brion originally focused on creating an aerial-image sensor, called Aerion, with nanometer resolution for use in lithographic scanners for the semiconductor industry. However in 2005, the company switched gears to focus on computational lithography. It became a leading supplier of verification solutions within a couple years – and quickly drew the attention of ASML.

Read more about the history of Brion

The same hardware and software that had been built to support the Aerion sensor was repurposed for high-speed image-based verification of post-OPC mask layouts – a wise move that later proved very valuable. Brion leveraged its modeling expertise and the scalability of its Tachyon computer architecture to become a leading supplier of computational verification tools.


They developed detailed software models that captured the physical and chemical effects encountered throughout the lithographic imaging process, providing the foundation on which all Brion products are built.


The growth of the company and the promise of its products led ASML to acquire Brion in early 2007. With Moore's Law requiring ongoing improvements in scanner performance and control, a holistic approach to lithography became essential. Scanner control capability is now intricately linked to computational lithography and advanced metrology.

Computational lithography

ASML Brion offers a comprehensive suite of software solutions in the process-window enhancement and process-window control spaces.

Mathematical and algorithmic approaches are used to optimize the blueprint of the chip pattern as well as control the scanner in real time during production.

The product suite and technology address key patterning challenges facing the semiconductor industry as it progresses, whether related to overlay or to imaging, and covering both state-of-the-art multi-patterning and EUV applications.

Read more about: Computational Lithography