Bert van der Pasch, Fellow at ASML

Bert van der Pasch

An expert in position measurement systems for lithography scanners

In memoriam: Bert passed away on October 31, 2021. He will be greatly missed by his colleagues and friends.

"When it comes to a given design, all stakeholders must trust you, your design, and your explanation of why and how it offers the best solution."

Bert van der Pasch was an expert in precision mechanics and position measurement systems. His contributions have been critical to meeting ever tighter requirements for lithography systems to position the light at the right spot on the wafer to create complex integrated circuit patterns.


Bert’s contributions ranged from inventions in the field of interferometers used in the historic PAS platform to the introduction of a stage positioning method used in the current DUV NXT platform – and all the way to High-NA stage and mirror position measurement in ASML’s EUV systems.


Bert passed away on October 31, 2021. He will be remembered as a gentle, calm and knowledgeable ASML employee with a high sense of responsibility. One colleague, who worked with him for many years, put it simply: “With some people, it is just an honor and a fortune to work with. Bert definitely was such a person."

About Bert
  • Joined ASML in 1989

  • Named a Fellow in 2008

  • Worked in Veldhoven, the Netherlands

Key contributions

  • PAS stepper and scanner interferometer

  • NXT grid-plate measurement system


Stage metrology systems


Holds 86 US patents across 85 ASML patent families

A wafer is exposed inside an ASML EUV lithography machine

Learn more about Bert

The TWINSCAN platform is a revolution in lithography. Bert was part of the team that first developed this innovative, dual stage technology.

Read the story