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PAS 5500/1150C

193-nm Step-and-Scan

  • Variable 0.75-NA 193-nm Projection Lens with Advanced Lens Manipulators
  • AERIAL II Illuminator
  • PAS 5500 Step-and-Scan Body
  • ATHENA Advanced Alignment Combined With Reticle Blue Align
  • 20-W ArF Laser With Variable Laser Frequency Control
  • Batch Streaming With ARMS
  • Image Streaming Package

The PAS 5500/1150C 193-nm Step-and-Scan system enables cost effective 90-nm ArF mass production.
The PAS 5500/1150C is the solution for both 90-nm critical and non critical ArF layers. The PAS 5500/1150C can be configured with a number of options that enable low-k
1 in manufacturing, extending application of the PAS 5500/1150C below 90 nm.

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