ASML is one of the world’s leading manufacturers of chip-making equipment. Headquartered in Veldhoven, the Netherlands, ASML employs more than 21,000 people.
The PAS 5500/100D i-line stepper is designed for mass production at 0.4 μm and achieves extremely high throughput while maintaining the utmost versatility with its variable Numerical Aperture (NA). This stepper extends i-line’s capability for manufacturing multiple generations of sub-half-micron design rules by optimizing both depth of focus and resolution for critical process layers.
|Usable depth of focus:||≥ 1.1 μm|
|Distortion:||≤ 60 nm|
|99.7% with 2 pt. Global Alignment:||< 60 nm|
Production ThroughputWith field-by-field leveling, 200-mJ/cm2 dose and at specified overlay accuracy
|Intensity:||≥ 900 mW/cm2|
|Variable coherence range:||σ = 0.3—0.7|
Automated Variable-NA i-Line Projection Lens
Lens technology allowing 0.40-μm imaging.
Completely redesigned variable partial Coherence Illuminator
1.5-kW illuminator power results in 900 mW/cm2 at wafer level.
Broadband Field-by-field Focus Leveling System
Leveling while moving from one site to another.
Advanced Light-weight Stage
High precision combined with high throughput.
Direct Reticle-Referenced, Through-The-Lens (TTL)
Optimum overlay and matching.
Built-In CLASS 1 Laminar Airflow
Enhances interferometer stability, provides ultra-clean wafer environment.