ASML is one of the world’s leading manufacturers of chip-making equipment. Headquartered in Veldhoven, the Netherlands, ASML employs more than 14,000 people.
The PAS 5500/275D is an i-line stepper stretching resolution down to 0.28 μm and beyond. It is built on the success of the proven PAS 5500/250C advanced i-line stepper.
The PAS 5500/275D features improved imaging achieved by applying the latest techniques in lens adjustment as well as improved overlay by including phase modulation in the system. In addition to that, Image Quality Control is included as standard. Leadership productivity is improved to more than 100 wph (ATP settings). The PAS 5500/275D uses an AERIAL illuminator, which provides flexible and automated NA/sigma combinations in both conventional and off-axis illumination modes while maintaining high intensities to enable economical mass production of leading-edge devices.
|Resolution:||≤ 0.28 μm|
|Distortion:||≤ 40 nm|
Overlay99.7% with 2 pt. global alignment
Production throughput200-mJ/cm2 exposure dose
Batch Streaming with ARMSContinuous-flow manufacturing.
Variable, High-NA i-line Lens
Production resolution down to 0.28 μm.
Innovative 3.5-kW AERIAL Illuminator
Maximum throughput over partial coherence and annular range.
Continuously variable partial coherence and annular illumination using AERIAL Optics
Process latitude optimization for different process layers.
Software-controlled Lens NA and Illuminator
Flexible automated imaging optimization in production settings.
Focused Reticle Masking System
Maximizes available reticle area.
Direct Reticle-referenced, Through-The-Lens (TTL) Phase-grating Alignment
Optimum overlay and matching using alignment beam phase modulation.
Advanced High Speed Stage
Precision with high throughput.