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PAS 5500/350C

  • Variable 0.63-NA Deep UV Lens, Full Stepper Field
  • Continuously variable partial coherence and annular illumination
  • Beam delivery laser technology
  • Through-The-Lens (TTL) phase modulated alignment

The PAS 5500/350C is a Deep UV stepper for 0.15-μm applications and beyond. The high productivity and low cost of ownership allow capacity extensions in existing DUV stepper fabs as well. The PAS 5500/350C system provides a very cost-effective mix-and-match lithography solution when used in conjunction with other ASML PAS 5500 i-line and DUV steppers.

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