ASML is one of the world’s leading manufacturers of chip-making equipment. Headquartered in Veldhoven, the Netherlands, ASML employs more than 21,000 people.
The PAS 5500/350C is a Deep UV stepper for 0.15-μm applications and beyond. The high productivity and low cost of ownership allow capacity extensions in existing DUV stepper fabs as well. The PAS 5500/350C system provides a very cost-effective mix-and-match lithography solution when used in conjunction with other ASML PAS 5500 i-line and DUV steppers.
|Intensity annular:||225 mW/cm2|
|Uniformity annular:||≤ 1.4%|
|Resolution:||≤ 0.15 μm|
|UDOF (NA 0.63, Annular):||≥ 0.5 μm|
|CD Uniformity @ BF (NA 0.63, Annular):||≤ 22 nm|
|Stage repeatability:||≤ 15 nm|
|Single-machine Overlay AA:||≤ 28 nm|
|Matched-machine overlay AB:||≤ 60 nm|
Production Throughput30-mJ/cm2 exposure dose
|Beam delivery:||20-m remote capability|
Variable 0.63-NA Deep UV Lens, Full Stepper Field
Production resolution down to 150 nm.
Continuously variable partial coherence and annular illumination
Fully automated imaging optimization for different process layers.
Beam delivery laser technology
Remote laser location to facilitate easy maintenance and safe operation.
Through-The-Lens (TTL) phase modulated alignment
For optimum overlay and matching simultaneous with industry-leading throughput.