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PAS 5500/750F

DUV Step and Scan

  • Variable, 0.7 NA Deep UV Projection Lens
  • Step and Scan
  • AERIAL II Illumination with QUASAR and Optional Multiple Exposure Capability
  • PAS 5500 Step-and-Scan Body
  • 8-Spot Level Sensor
  • ATHENA Advanced Alignment
  • Includes 2kHz 20W KrF Laser Technology with VariableLaser Frequency Control

The PAS 5500/750F DUV Step-and-Scan system enables 130-nm mass production using mature 248-nm KrF technology. It combines the imaging power of the improved 0.7 NA 4x reduction lens with the latest multi-spot innovations in the leveling system and the AERIAL II illumination technology including QUASAR, multipole illumination and optional multiple exposure capability. The system is equipped with both TTL alignment and ATHENA for improved alignment accuracy on backend process layers, providing a long term single machine overlay of less than 25 nm.

Further reduction of overhead times in combination with enhancements in productivity on customer jobs provide a production throughput of 130 200-mm wph.
The application of a 2 kHz 20W KrF laser with Variable laser Frequency Control results in the lowest possible Cost of Operation.

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