DUV Step and Scan
- Variable, 0.7 NA Deep UV Projection Lens
- Step and Scan
- AERIAL II Illumination with QUASAR and Optional Multiple Exposure Capability
- PAS 5500 Step-and-Scan Body
- 8-Spot Level Sensor
- ATHENA Advanced Alignment
- Includes 2kHz 20W KrF Laser Technology with VariableLaser Frequency Control
The PAS 5500/750F DUV Step-and-Scan system enables 130-nm mass production using mature 248-nm KrF technology. It combines the imaging power of the improved 0.7 NA 4x reduction lens with the latest multi-spot innovations in the leveling system and the AERIAL II illumination technology including QUASAR, multipole illumination and optional multiple exposure capability. The system is equipped with both TTL alignment and ATHENA for improved alignment accuracy on backend process layers, providing a long term single machine overlay of less than 25 nm.
Further reduction of overhead times in combination with enhancements in productivity on customer jobs provide a production throughput of 130 200-mm wph.
The application of a 2 kHz 20W KrF laser with Variable laser Frequency Control results in the lowest possible Cost of Operation.
|Resolution:||≤ 130 nm|
- Max X:26.0 mm
- Max Y:33.0 mm
- BF:≤ 10 nm
- Over 0.4-μm defocus:≤ 15 nm
- BF:≤ 10 nm
- Over 0.4-μm defocus:≤ 25 nm
|Distortion (Dynamic):||≤ 20 nm|
|Single-machine:||≤ 25 nm|
|Matched-machine:||≤ 40 nm|
- Intensity:≥ 2400 mW/cm2 (@ NA Max)
- σ out:0.35–0.88
- σ in:0.10–0.58
- Integrated slit uniformity:≤ 0.8%
- σ out: 0.35–0.88
- σ in: 0.10–0.58
- Integrated slit uniformity: ≤ 1.0%
Production Throughput50-mJ/cm2 exposure dose
- 200-mm wafers, 46 shots:≥ 130 wph
|Type:||Cymer ELS6600, Gigaphoton KES-G2OK|
|Frequency:||Continuously variable up to 2 kHz|
|Beam Delivery:||≤ 20-m remote capability|
Variable, 0.7 NA Deep UV Projection Lens
Production resolution down to 130 nm.
Step and Scan
Large field size, better CD control and lower lens aberrations.
AERIAL II Illumination with QUASAR and Optional Multiple Exposure Capability
Provides the ultimate flexibility in illumination modes at maximum throughput.
PAS 5500 Step-and-Scan Body
Commonality with i-line and 193-nm Step-and-Scan tools for economic mix-and-match.
8-Spot Level Sensor
Improved focus and leveling under production conditions.
ATHENA Advanced Alignment
Increased alignment accuracy process latitude.
Includes 2kHz 20W KrF Laser Technology with VariableLaser Frequency Control
The perfect combination of high laser power for high throughput and efficient use of laser pulses for the lowest possible laser Cost of Operation.