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PAS 5500/8TFH-A

  • SmartStart
  • Proven AlTiC Wafer Handling
  • KrF Starlith 870 Projection Lens with Variable NA Up to 0.80
  • UNICOM, ADE
  • IOSc-4
  • PAS 5500 Step-and-Scan Body
  • Multiple Exposure Technique

The PAS 5500/8TFH-A KrF Step-and-Scan system is a dedicated lithography tool for thin-film head (TFH) production on 125-mm, 150-mm, and 200-mm AlTiC wafers.
It combines a powerful, variable NA up to 0.8 lens with the proven thick AlTiC wafer handling of a PAS body and specific alignment improvements for the TFH environment.
The result is a new standard for TFH production at current and future technology nodes.

TFH manufacturing involves printing sub-100-nm isolated features, which demands extremely low lens aberration levels. The PAS 5500/8TFH-A uses the proven ultra-low aberration KrF lens from the XT platform on the PAS body, ensuring excellent performance and a low cost of ownership. The low thermal conductivity of AlTiC wafers means maximum throughput on the track is restricted, allowing the PAS 5500/8TFH-A more time for alignment and wafer stabilization. In addition, the PAS 5500/8TFH-A features further improvements to the dynamics.
Together, these translate into industry-leading overlay and stitching performance on AlTiC wafers.

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