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TWINSCAN NXT:1980Di

193-nm Step and Scan

  • For customers in Germany, as of March 23, 2018 this product is only available in a new and modified version, and under a different model number.
  • Vastly Improved Overlay Performance
  • Vastly Improved Focus Performance
  • 1.35-NA 193-nm Catadioptric Projection Lens
  • FlexRay Prepared Illuminator for Maximum Flexibility
  • In-Situ Metrology per wafer exposure
  • Increased Productivity and Reduced Defectivity
  • Focus Spot Monitoring and Cleaning
  • Litho-Cell Stability and Performance Control
  • Computing platform

The TWINSCAN NXT:1980Di Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume production 300-mm wafers at the sub 10-nm node.

The TWINSCAN NXT:1980Di is equipped with the successful in-line catadioptric lens design, having a numerical aperture (NA) of 1.35 – the highest in the industry.

In-situ measurement and correction of optic aberrations enable maximum imaging performance for each wafer exposed when imaging at very low-k1.

Advanced in-situ metrology per wafer together with a comprehensive set of options to input off-line metrology data to the scanner enable maximum overlay, focus and CDU performance on product wafers.

By combining high productivity and excellent image resolution with unprecedented overlay and focus performance, the TWINSCAN NXT:1980Di addresses multiple patterning requirements and thus provides a cost-effective solution for the sub 10-nm nodes.

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