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TWINSCAN XT:1460K

193-nm Step and Scan

  • Variable 0.93-NA 193-nm Projection Lens With Advanced Lens Manipulators
  • Ultra-k1 Package
  • Superior Overlay
  • High-Speed Dual-Stage Technology

The TWINSCAN XT:1460K 193-nm Step-and-Scan system is a high-productivity, dual-stage ArF lithography tool designed for volume 300-mm wafer production at 65-nm resolution. The TWINSCAN XT:1460K system combines the imaging power of a variable 0.65–0.93-NA Carl Zeiss Starlith 4X reduction lens with AERIAL-P illuminator technology, extending ArF technology beyond the 65-nm technology node. The dual wafer-stage technology of the TWINSCAN platform enables the exposure of one wafer and the alignment of the next wafer to take place in parallel, virtually eliminating overhead time and allowing for continuous patterning of wafers for maximum productivity. The off-line leveling system guarantees superior focus control over the full wafer, including edge dies. A standardly delivered 45-W ArF laser with variable frequency control, in combination with the high optical transmission of the complete system, provides a production throughput of 205 wph (300 mm). The tool is prepared to operate at extreme low-k1 values, delivering excellent CD uniformity, industry leading overlay and long term performance stability.

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