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TWINSCAN XT:860M

248-nm Step and Scan

  • Variable 0.80-NA 248-nm 860+ Projection Lens
  • AERIAL II Illuminator
  • LithoGuide ILIAS
  • High-Speed Dual-Stage Technology
  • 40-W KrF Laser Technology With Variable Laser Frequency Control

The TWINSCAN XT:860M 248-nm Step-and-Scan system is a high-productivity, dual-stage KrF lithography tool designed for volume 300-mm wafer production at and below 110-nm resolution. Combining the imaging power of a variable 0.55–0.80-NA Carl Zeiss Starlith 860+ 4X reduction lens with AERIAL II and the optional QUASAR XL illuminator technology, the XT:860M extends volume proven KrF technology to 110-nm applications.

Highly line-narrowed 40-W KrF lasers with variable frequency control, in combination with the high optical transmission of the optical system, provide a production throughput of 240 300-mm wph with the lowest possible cost of operation.

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