Press release - Tempe, Arizona, December 7, 1999
To increase its manufacturing capacity in advanced semiconductor devices, White Oak Semiconductor has placed an order with ASM Lithography (ASML) for multiple PAS 5500/700 deep UV Step & Scan systems. The lithography tools are being installed in White Oak's wafer fab in Richmond, Virginia. ASML's PAS 5500/700 product is designed for 150 nm design rule applications with a production throughput of 104 200 mm wafers per hour. Introduced in October 1998, it is the world's first production-worthy system for 150 nm lithography, combining the industry's fastest scanning stages with the highest numerical aperture (NA) lens, capable of a 0.70 NA.
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