ASML EUV lithography machines overview page

EUV lithography systems

Providing highest-resolution lithography in high-volume manufacturing, ASML’s EUV machines are pushing Moore’s Law forward.

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Using a wavelength of just 13.5 nanometers (nearly x-ray level), our EUV technology can do big things on a tiny scale. Developed over 20 years of sustained R&D, our machines are now gearing up to power the next 20.

TWINSCAN NXE:3600D

The TWINSCAN NXE:3600D is ASML’s latest-generation lithography system, supporting EUV volume production at the 5 and 3 nm Logic nodes and leading-edge DRAM nodes.

TWINSCAN NXE:3400C

The TWINSCAN NXE:3400C lithography system supports EUV volume production at the 7 and 5 nm nodes.

EUV lithography systems

Using a wavelength of just 13.5 nanometers (nearly x-ray level), our EUV technology can do big things on a tiny scale. Developed over 20 years of sustained R&D, our machines are now gearing up to power the next 20.

TWINSCAN NXE:3600D

TWINSCAN NXE:3400C

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