Providing highest-resolution lithography in high-volume manufacturing, ASML’s EUV machines are pushing Moore’s Law forward.
Using a wavelength of just 13.5 nanometers (nearly x-ray level), our EUV technology can do big things on a tiny scale. Developed over 20 years of sustained R&D, our machines are now gearing up to power the next 20.
TWINSCAN NXE:3400C
The TWINSCAN NXE:3400C is our latest-generation EUV lithography system, combining productivity, highest resolution, and state-of-the-art overlay and focus performance.
