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Press release

TSMC places order with ASML for advanced 300 mm technology

Veldhoven, the Netherlands, June 20, 2000

ASML today announced that it has received an initial order for its new 300 mm technology platform from TSMC, a world leading IC foundry company. The first shipments include DUV (248 nm) and i-line (365 nm) systems to be installed in TSMC's 300 mm pilot line in Tainan, Taiwan.


"We are very pleased that TSMC has selected our new advanced technology for their planned 300mm volume foundry operation," said Dave Chavoustie, ASML's executive vice president of worldwide sales. "This order represents a solid endorsement of our comprehensive technology leadership from the world's recognized leading foundry manufacturer."


Dr. N.S. Tsai, senior director of TSMC's 300 mm pilot line, said, "TSMC has put together a strong team dedicated to developing 300 mm technology and has had each module in readiness for production. The installation of ASML's new 300 mm technology platform will further boost TSMC lithography technology competitiveness and will therefore help TSMC to become one of the first IC companies to start 300 mm wafer volume production in the near future."


The new platform is specifically designed for 300 mm wafers and provides fundamental innovations in system architecture and stage design to meet the highest productivity requirements. It is designed to support multiple generations of optical lithography technologies from i-line to 157 nm. The first shipment is scheduled for the third quarter of this year. ASML plans a public introduction at the industry's SEMICON West trade show in July.

About ASML


ASML, founded in 1984, is a world leader in advanced photolithography systems that are essential in the fabrication of integrated circuits. The company is publicly traded on both the Amsterdam Exchanges and on the Nasdaq Stock Market under the symbol 'ASML'. Visit the company's web site at www.asml.com for more information.

Forward-looking statements


'Safe Harbor' Statement under the Private Securities Litigation Reform Act of 1995: Except for historical information, the matters discussed in this news release that may be considered forward-looking statements may be subject to certain risks and uncertainties that could cause the actual results to differ materially from those projected, including uncertainties in the market, pricing competition, procurement and manufacturing efficiencies, and other risks detailed from time to time in reports filed by the Company with the Securities and Exchange Commission. The Company assumes no obligation to update the information in this release.

Contact information

  • Brittney Wolff
  • Corporate communications manager US
  • +14084833207