Press release - Tokyo, Japan, December 5, 2001
On the opening day of SEMICON Japan 2001, ASML announced the creation of a new Asian training center based in Kawasaki, Japan. The facility will provide a variety of training courses in advanced lithography, wafer track and thermal processing technology, with a particular focus on 300 mm equipment. Initial training in the use of wafer steppers and Step & Scan systems will begin during the second quarter of 2002, with 300 mm-focused training being phased in during the third and fourth quarters of 2002.
"Technology in the semiconductor industry is constantly evolving. ASML is dedicated to providing training centers that feature skilled instructors, well-equipped facilities and well-organized courses to help our customers optimize productivity," said Stuart McIntosh, ASML executive vice president of operations and president of the company's Lithography division. "Japan is an important market for ASML. This new ASML facility demonstrates our commitment to supporting our customers here."
The Kawasaki training center is a 36,000-square-foot facility that includes a significant portion of cleanroom space for practical system experience. It becomes ASML's fifth technology training center, joining others in Veldhoven, the Netherlands; Tempe, Arizona; Kiheung, South Korea; and Hsinchu City, Taiwan.
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