Press release - Veldhoven, the Netherlands, June 5, 2001
Demonstrating growing global acceptance for its new 300 mm TWINSCAN lithography platform, ASML announced today that it has won a volume purchase order from Infineon Technologies AG (FSE/NYSE: IFX), one of the world's leading semiconductor companies. The first part of the order for multiple TWINSCAN systems, including KrF and ArF scanners, is valued at more than €50 million.
The delivery of the first systems from ASML's manufacturing site in Veldhoven, the Netherlands, is scheduled to ship this month to Infineon's SC300 world-leading 300 mm production fab for advanced memory ICs in Dresden, Germany. ASML's TWINSCAN platform, capable of handling both 300 mm and 200 mm wafers, incorporates fundamental innovations in system architecture and stage design to meet the highest productivity requirements. Using the proven imaging performance of Carl Zeiss Starlith optics, the system supports multiple generations of optical lithography from i-line to 157 nm. TWINSCAN uses a novel 'balance mass' system designed to effectively eliminate stage-induced system vibration, thereby increasing focus budgets and image contrast. Further improvements reduce sensitivity to environmental disturbances including temperature variations, thus helping to extend TWINSCAN's imaging to sub-100 nm design rules.
"We are pleased to expand our business partnership with Infineon, which has an installed base of our PAS 5500 systems at its fab in Richmond, Virginia," said Dave Chavoustie, ASML's executive vice president of sales. "This order demonstrates growing acceptance of our TWINSCAN technology for leading-edge 300 mm applications."
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