Press release - Santa Clara, California, September 24, 2002
ASML MaskTools today announced its new MaskWeaver product, a powerful mask design and optimization software solution enabling the creation of advanced photomasks for the nanometer era.
MaskWeaver is a hierarchical model-based OPC product that provides a complete implementation of ASML's patented chromeless phase lithography (CPL) and double dipole lithography (DDL) technologies – two highly innovative resolution enhancement techniques for sub-100 nm lithography. In order to further the development and adoption of MaskWeaver and CPL technology, MaskTools has established partnerships with a select group of leading-edge semiconductor companies for the 90 nm and 65 nm nodes.
"MaskWeaver has been architected from the ground up to directly address the special mask making and lithography requirements of next generation technology nodes," said Dinesh Bettadapur, president and CEO, ASML MaskTools. "By being a primary enabler for CPL and DDL technologies, MaskWeaver has the potential to deliver significant value to our customers."
MaskWeaver is being showcased at the 22nd Annual BACUS Symposium on Photomask Technology, held September 30 to October 4 at the Monterey Convention Center in Monterey, California. During the exhibition portion of the show, October 1–2, ASML MaskTools will demonstrate MaskWeaver and its companion product, LithoCruiser. They will also present a paper and two posters showing the progress on various features of CPL technology including results from MaskWeaver and LithoCruiser.
Information for the event is as follows:
Event
22nd Annual BACUS Symposium on Photomask Technology
Date: October 1–4
Location: Exhibit Hall, Monterey Convention Center, Monterey, California
Product demonstrations
MaskWeaver and LithoCruiser, ASML Booth #309
Tuesday and Wednesday, Oct 1–2, 10:00 am–4:00 pm
Paper presentation
Tuning MEEF for CD control at 65nm node based on chromeless phase lithography (CPLTM) - Thursday, October 3 at 4:45 pm–5:10 pm
Posters
- Application of chromeless phase lithography (CPL) masks in ArF lithography
- Mesa or trench type of chromeless phase-shift lithography mask: an investigation from photolithographic performance point of view
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