ASML MaskTools to showcase new MaskWeaver product

Will be presented during 2002 BACUS Symposium on photomask technology

Press release - Santa Clara, California, September 24, 2002

ASML MaskTools today announced its new MaskWeaver product, a powerful mask design and optimization software solution enabling the creation of advanced photomasks for the nanometer era.

MaskWeaver is a hierarchical model-based OPC product that provides a complete implementation of ASML's patented chromeless phase lithography (CPL) and double dipole lithography (DDL) technologies – two highly innovative resolution enhancement techniques for sub-100 nm lithography. In order to further the development and adoption of MaskWeaver and CPL technology, MaskTools has established partnerships with a select group of leading-edge semiconductor companies for the 90 nm and 65 nm nodes.

"MaskWeaver has been architected from the ground up to directly address the special mask making and lithography requirements of next generation technology nodes," said Dinesh Bettadapur, president and CEO, ASML MaskTools. "By being a primary enabler for CPL and DDL technologies, MaskWeaver has the potential to deliver significant value to our customers."

MaskWeaver is being showcased at the 22nd Annual BACUS Symposium on Photomask Technology, held September 30 to October 4 at the Monterey Convention Center in Monterey, California. During the exhibition portion of the show, October 1–2, ASML MaskTools will demonstrate MaskWeaver and its companion product, LithoCruiser. They will also present a paper and two posters showing the progress on various features of CPL technology including results from MaskWeaver and LithoCruiser.

Information for the event is as follows:


22nd Annual BACUS Symposium on Photomask Technology
Date: October 1–4

Location: Exhibit Hall, Monterey Convention Center, Monterey, California

Product demonstrations

MaskWeaver and LithoCruiser, ASML Booth #309
Tuesday and Wednesday, Oct 1–2, 10:00 am–4:00 pm

Paper presentation

Tuning MEEF for CD control at 65nm node based on chromeless phase lithography (CPLTM) - Thursday, October 3 at 4:45 pm–5:10 pm

  1. Application of chromeless phase lithography (CPL) masks in ArF lithography
  2. Mesa or trench type of chromeless phase-shift lithography mask: an investigation from photolithographic performance point of view

About ASML MaskTools

MaskTools Inc. is a wholly owned subsidiary of ASML based in Santa Clara, California. The company offers leading-edge optical extension technologies and products to the semiconductor industry. Core products include MaskWeaver for full-chip OPC/CPL/DDL mask optimization and LithoCruiser for lithography process analysis and optimization. As optical lithography continues to be used for volume IC manufacturing below the wavelength of the exposure light source, these technologies and products enhance the photolithography process latitude thereby improving integrated circuit yields in manufacturing.

Contact information

  • Brittney Wolff Zatezalo
  • Corporate communications manager US
  • +14084833207