Press release - Santa Clara, California, February 4, 2003
ASML MaskTools today announced that it has been awarded a business contract by Carl Zeiss SMT AG to support the design of high numerical aperture (NA) 193 nm and 157 nm lenses. Lens quality and consistency are increasingly important factors as line widths shrink to below half the wavelength of the exposure tool. ASML MaskTools was engaged to develop a unique method and software implementation for the lenses, improving layout cycle times while maintaining design quality.
“Leveraging its unique expertise in optics, mask making and software development, ASML MaskTools created a very sophisticated software package that fully meets our requirements,” said Gerhard Furter, vice president, Lithography Optics Division, Carl Zeiss SMT. “This cooperative effort has improved our lens qualification efforts, helping to maintain our competitive advantage.”
“ASML is pleased to extend its long standing partnership with Carl Zeiss into the software arena,” said Dinesh Bettadapur, president and CEO, ASML MaskTools. “In developing an innovative software application to address Zeiss’ challenging requirements, we ultimately benefit our customers by ensuring the continuous supply of the most advanced imaging tools.”
ASML and Carl Zeiss SMT AG are the industry leaders in 193 nm imaging technology today and are also actively developing next-generation 157 nm imaging technology.
