Press release - Santa Clara, California, and Tokyo, Japan, February 23, 2004
ASML MaskTools and Dai Nippon Printing (DNP) today announced a strategic alliance on CPL Technology. A single-mask, single-exposure resolution enhancement technique, CPL Technology is designed to increase the productivity of lithography processes by as much as 40% as compared with competing technologies as well as enhancing cost effectiveness and resolution capability. This new agreement extends industry support for CPL Technology and builds additional momentum for its adoption.
“This is an exciting time to join forces with ASML MaskTools as it pioneers critical advancements in low k1 lithography,” said Naoya Hayashi, general manager, Electronic Device Laboratory, DNP. “We are impressed with the performance of CPL Technology and consider it to be one of the viable techniques to maximize lithography investments.”
As part of the agreement, DNP will develop a production-worthy mask-making process that ensures delivery of high-quality CPL masks with fast turnaround times to semiconductor manufacturers around the world. To date, DNP has delivered a number of CPL test masks with positive results. ASML MaskTools will provide DNP an R&D license for its portfolio of CPL Technology patents.
“This endorsement from the world’s leading mask maker, DNP, is further proof of the benefits CPL Technology will bring to our global customer base,” said Dinesh Bettadapur, president and CEO, ASML MaskTools. “Collaborating with DNP and other industry leaders has resulted in a complete CPL solution flow. All the necessary elements are now in place for the adoption of CPL by chip manufacturers and foundries.”
ASML, the world’s leading provider of lithography systems for the semiconductor industry, is the only company offering its customers a complete portfolio of hardware and software solutions that extend the capabilities of optical lithography.
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About Dai Nippon Printing
