Cadence and ASML sign multiyear business agreement to develop advanced DFM solutions

Cadence Design Systems, Inc. (NYSE: CDN) and ASML MaskTools, an ASML business unit, today announced a multi-year, multi-million dollar software licensing and joint development agreement for advanced resolution enhancement technology (RET) software solutions. The two companies will work together to develop a tightly integrated design for manufacturability (DFM) flow.

Under the agreement, Cadence will license and co-develop two ASML MaskTools software packages: MaskWeaver, a full-chip RET and optical proximity correction (OPC) mask and optimization solution, and LithoCruiser, a lithography process analysis and optimization solution. Cadence will become the sole worldwide distributor for MaskWeaver while both Cadence and ASML MaskTools will distribute LithoCruiser to their respective electronic design automation (EDA) and manufacturing customers.

The products will be offered as standalone and integrated solutions within the Cadence Encounter and Virtuoso design platforms. These best-of-breed solutions will bridge the design-to-manufacturing gap and accelerate the rate at which customers can reach 65 nm and below in their semiconductor processes.

“The extension of optical lithography techniques at and beyond 65 nm emphasizes a new level of interdependence between design and lithography. Our customers want to shorten production ramp and improve volume production yield through the use of the most advanced design tools linked to the most advanced technologies for resolution enhancement,” said Lavi Lev, executive vice president and general manager, Cadence Design Systems. “With this new agreement, Cadence customers gain access to leading-edge RET and lithography simulation software as well as the world-class development team at ASML MaskTools.”

“ASML and Cadence share many of the same customers. However, we approach them from different technological domains,” said Dinesh Bettadapur, president and CEO, ASML MaskTools. “Cadence is an acknowledged leader in EDA software and ASML MaskTools has long championed the drive to smaller design node geometries through innovative manufacturing technologies and software products. Together, we will deliver the most complete DFM product portfolio to chip designers and manufacturers.”