Press release - Tokyo, Japan; Veldhoven, the Netherlands; and Oberkochen, Germany, September 29, 2004
Nikon Corporation (Nikon), ASML Holding NV (ASML) and Carl Zeiss SMT AG (SMT) have agreed to a comprehensive settlement of legal proceedings and cross-license of patents related to lithography equipment used to manufacture semiconductor devices.
The Memorandum of Understanding is a binding agreement that continues the previously announced stays on all patent disputes pending between Nikon, ASML and SMT in Asia and the United States. The three companies expect to execute definitive settlement and cross-license agreements and dismiss all legal proceedings between the parties in November 2004.
The terms of the Memorandum include payments to Nikon by ASML and SMT. ASML will pay a total of US$87 million (approximately €71 million). An initial payment of US$60 million (approximately €47 million) will be made in 2004, with the remaining equal installments due in 2005, 2006 and 2007. SMT will pay a total of US$58 million (approximately €48 million). An initial payment of US$40 million (approximately €32 million) will be made in 2004, with the remaining equal installments due in 2005, 2006 and 2007.
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Forward-looking statements