February 6, 2001
January 31, 2001
New system extends 248 nm lithography to 120 nm resolution applications
January 18, 2001
January 8, 2001
Will refile petition for Exon-Florio review
December 19, 2000
December 6, 2000
November 14, 2000
November 7, 2000
Developed for the 100 nm technology node
October 10, 2000