Work at the edge of what’s possible in optics.

Imagine perfecting an optical system where aberrations are kept to within one thousandth of the wavelength of light used.

In this optical system, 200 kg reflectors need to be positioned to within an accuracy of less than a nanometer, and then repositioned every second to compensate for millikelvin fluctuations.

The optical light path inside an EUV machine

Take a look at the inner workings of our extreme ultraviolet (EUV) lithography machine as you follow the full light path from source to wafer.

Light is generated in the EUV source, sent into the illuminator that controls the light beam, and reflects off the mask with the chip pattern before being focused in the projection optics and exposing the silicon wafer.

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