Loading component...
Loading component...
Key features & benefits
The TWINSCAN XT:860N step-and-scan system is a high-productivity, dual-stage KrF lithography machine designed for volume production of 200 and 300 mm wafers at and below 110 nm resolution.
By combining the imaging power of a variable 0.55–0.80 NA ZEISS Starlith 860+ 4X reduction lens with AERIAL II and the optional QUASAR XL illuminator technology, the XT:860N extends today’s volume-proven KrF technology to 110 nm applications.
01.Productivity
Loading component...
The AERIAL II Illuminator also enables continuous-variable conventional and off-axis illumination with zoom optics, and the system’s high-speed, dual-stage technology helps to maintain these high throughput levels over a wide range of resist sensitivities.
02. Optics
The TWINSCAN XT:860N step-and-scan system includes a variable 0.80 NA 248 nm 860+ projection lens to attain very low aberration levels for tight focal planes and excellent distortion control with annular distortion of ≤ 10 nm.
03. Imaging performance
The TWINSCAN XT:860N step-and-scan system can achieve a ≤ 7.5 nm matched-machine (to reference wafer) full-wafer-coverage overlay. The system’s LithoGuide ILIAS sensor allows customers to more accurately set up the system and monitor its imaging parameters.
