Loading component...
Loading component...
Key features & benefits
Our highest-resolution e-beam system to date, the eP5 offers critical dimension (CD) metrology and defect detection at high throughput.
The eP5 is as at home in the fab as it is in the R&D lab, allowing chipmakers to monitor process performance in production and verify optical proximity correction (OPC) models in development.
01. Versatility
The eP5 combines precise CD metrology with high-resolution defect detection in one system. For wafer inspection, it can operate in both physical defect and voltage contrast mode to detect patterning and electrical defects.
02. Sensitivity
Loading component...
03. Throughput
A large (12,000 x 12,000 pixel) field of view enables high scanning throughput. Additionally, the eP5 can carry out CD metrology and wafer inspection at the same time to maximize productivity.
