“At ASML, you get to work in some amazing teams – innovation is always a team effort.”
An expert in machine dynamics, Maurice played a key role in the successful development of ASML’s NA = 0.55 EXE EUV lithography platform. He was responsible for realizing a machine dynamics architecture that enables outstanding imaging and overlay performance. Thanks in no small part to his work, ASML customers will be able to deliver tomorrow’s next-generation chips with high yields.
People who work with Maurice praise his extensive technical knowledge and deep experience spanning multiple disciplines and modules. He is known by our customers for his ability to bridge the gap between environmental constraints and high-precision engineering They also value his leadership, creativity and ability to solve complex challenges effectively and efficiently while meeting the needs of ASML and its customers.
Get to know Maurice
- ASML employee since 1999
- Named a Fellow in 2025
- Based in Veldhoven, the Netherlands
Key contributions
- Realizing a machine dynamics architecture for the NA = 0.55 EXE platform
- Contributing to the NXE:3100 platform and NXE:3300 source
- Mechatronic architecture to enable improved thermal control of EUV mirrors
Expertise
Mechatronics and system dynamics
Patents
30 US patents (granted or pending) across 25 ASML patent families
