“Every crisis we face also presents an opportunity. It’s up to us how to investigate the problems involved and try to come up with solutions.”
Stephen Hsu has made significant contributions to the computational lithography software used by ASML customers to get the best imaging out of their DUV and EUV scanners.
Over the years, Stephen has contributed to resolution-enhancement techniques (RET), source-mask optimization (SMO) as well as optical proximity correction (OPC). He also teaches an advanced lithography short course internally at ASML and externally at SPIE, and mentors junior engineers.
Get to know Stephen
ASML employee since 2000
Named a Fellow in 2017
Based in San Jose, United States
DUV, EUV and High-NA EUV source-mask optimization
EUV scanner wavefront matching
Published more than 100 technical papers on lithography and resolution enhancement techniques
Imaging physics, optimization algorithms, resolution enhancement techniques
Holds 52 US patents across 39 ASML patent families