7-minute read - by Kate Brunton, July 31, 2018
If the prospect of becoming a manager doesn’t make you excited, don’t worry; there are other ways to advance your career. At ASML, people can steer clear of the ‘managerial’ track and choose the ‘expert’ or ‘project lead’ tracks instead. In this article, we highlight our two most recent ASML Fellows, a title awarded to experts in our R&D department who have made outstanding contributions to our technology.
Moving forward in your career doesn’t always have to mean becoming a manager. Back in 2012, the Harvard Business Review published an article entitled “Your Career Needs to Be Horizontal', which pointed out the fact that even then, though society has moved away from the traditional ‘career ladder’, most of us still assume that career success is vertical.
A certain degree of hierarchy is beneficial in any company. But now with over 24,000 people in countless different departments and locations worldwide, our employees think of ASML as a jungle gym to climb around, rather than a simple ladder. A playhouse here, a slide there, balancing bars over there. “We encourage our people to develop on the job,” says Heleen Cocu-Wassink, ASML’s global head of people development. “We do this by giving each other feedback, or for instance through a rotation to another department or a short- or long-term assignment abroad.”
At ASML, we recognize and honor our technical experts as well as our more traditional managers. How could we not? Our company’s success is built on technology leadership. One of the ways we do this is through fellowships.
We award the title of ‘fellow’ to a select few experienced employees who have made an ‘outstanding technical contribution’ to ASML and are recognized both inside and outside the company as a ‘top technical authority’. They’ve usually generated a significant amount of intellectual property and have a long list of patents and technical publications. They also demonstrate the ability to mentor other engineers.
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E-beam metrology uses a single electron beam to do very precise, high-resolution measurements in a specific location. This technique makes it possible for chipmakers to determine what the chip structure actually looks like. Multibeam metrology scales this technology to use multiple electron beams to measure multiple areas of a wafer simultaneously.
Patrick Tinnemans has submitted an incredible 189 patents in 56 patent families. The sheer number and variety of patents are testament to the depth and originality of his thinking and his dedication to each of the many projects he’s worked on during his 20 years at ASML. As Jos Benschop, ASML’s senior vice president of technology puts it, “Patrick combines his superb mathematical skills with a deep understanding of physics and optics. He has an enormous drive, making a significant contribution to ASML products like YieldStar critical dimension metrology, the ORION sensor, and NXT and NXE lens models.”
