"I consider myself lucky to have received valuable mentoring feedback over the years, often from older, more experienced colleagues. Now that I'm in the second stage of my career, I try to pay that forward."
Patrick Tinnemans has superb mathematical skills which he uses to tackle complex mathematical-physics problems and find practical solutions.
Patrick’s algorithms are used every day in fabs across the globe to obtain robust overlay, alignment and imaging in ASML’s lithography systems.
Get to know Patrick
ASML employee since 2000
Named a Fellow in 2018
Based in Veldhoven, the Netherlands
Correction of mark-deformation through measurement of pupil intensity for ORION wafer alignment sensor
Holds 87 US patents across 67 ASML patent families