“AI has huge potential for lithography. Let’s work together to make it happen!”
Larry is an expert in AI technologies and applications. At ASML, he has been a driving force behind the integration of AI and deep learning into computational lithography. His work helps ASML customers improve the yield and quality of their products.
Renowned for his strength in mathematics and algorithms, Larry is active in AI solutions across many different areas of lithography. This includes the Brion Newron model, the industry’s first deep-learning-based OPC solution capable of meeting production quality requirements. In addition to his extensive technical knowledge, Larry is known for his wide-ranging desire for knowledge and as a highly supportive team member.
Get to know Larry
- ASML employee since 2016
- Named a Fellow in 2025
- Based in San Jose, US
Key contributions
- Pioneer of deep learning technology in computational lithography
- Driving the development of AI solutions across diverse domains
- Contributions to the Brion Newron deep-learning-based OPC model
Expertise
Mathematics, algorithms and AI technologies
Patents
37 US patents (granted or pending) across 17 ASML patent families
