Slava Rokitski

Slava is one of ASML’s leading experts in laser technology for both DUV and EUV light sources. Drawing on his in-depth understanding of laser and plasma physics, he has made significant contributions to, among other things, the Cymer XLR excimer lasers used in our DUV systems, and the seed isolation module (SIM) that has helped EUV lithography breakthrough into high-volume chip production.

Involved in developing, implementing and troubleshooting source technologies, Slava is renowned for his commitment to providing real customer value. He demonstrates in-depth understanding of fundamental laser and plasma physics and possesses extensive knowledge of their system architecture- including their underlying physics, pivotal components and complex dependencies. Colleagues, technology partners and customers appreciate his dedication to cooperation, valuing his passion for inspiring and getting the best out of those around him.