Hans Butler
One of the world’s best at applying precision mechatronics to lithography systems
"As an engineer, nothing is more fun for me than making complex things work, either at a small scale at home or a large scale at ASML."
Hans Butler is an expert in lithography system dynamics and control with an impressive IP portfolio and a dedication to educating future generations of control engineers . He takes an integrated view on scanner module dynamics and their interaction, as well as on the control architecture, to optimize overall system accuracy.
In 2012, Hans became part-time professor at Eindhoven University of Technology, and has written a book on lithography system dynamics and control that is widely viewed as a “must read for mechatronics engineers." Hans was appointed an ASML Fellow and then Senior Fellow for his ongoing commitment and achievements in applying his thorough understanding of lithography system dynamics and control to improve overall system performance.
Get to know Hans
ASML employee since 1991
Named a Senior Fellow in 2023
Based in Veldhoven, the Netherlands
Key contributions
Control technologies for stages and other scanner modules
System dynamics solutions to reduce overlay errors
Contributed to the dynamic architecture of the 450 mm QXT, NXE and EXE platforms
Expertise
Lithography system dynamics and control
Patents
Holds 146 US patents across 110 ASML patent families
;
;
;
;