"Solving tough problems together with your ‘comrades in arms’ is really rewarding, especially when you eventually see the fruits of your labor working in the customer environment.”
Jan Mulkens has made his mark on various areas of ASML over the years. He has worked on a variety of projects and technologies, from an off-axis illuminator in 1994 to optical lithography for 193 nm the next year, to the first 193-nm system in 1999. He was the champion of immersion lithography, realizing a proof-of-concept immersion scanner in record time, which solidified ASML’s technology leadership.
To our customers, Jan is a trusted technology expert defining the most effective solutions that meet their node-on-node lithography requirements.
Get to know Jan
ASML employee since 1992
Named a Fellow in 2002
Named a Senior Fellow in 2015
Named a Corporate Fellow in 2020
Based in Veldhoven, the Netherlands
Optics, holistic lithography (scanner, metrology, computational lithography)
Holds 194 US patents across 80 ASML patent families