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TWINSCAN NXE:3300B

ASML’s TWINSCAN NXE platform is the industry’s first production platform for extreme ultraviolet lithography (EUVL). The NXE:3300B is the successor to the NXE:3100, offering 22 nm resolution with conventional illumination and 18 nm with off-axis illumination as well as improved overlay and higher productivity.

The NXE Step-and-Scan systems use 13.5 nm EUV light, generated by a tin-based plasma source. The systems feature all-reflective 4x reduction lens assemblies from Carl Zeiss SMT with a numerical aperture (NA) of 0.33 and a maximum exposure field of 26 mm by 33 mm.

For the NXE:3300B, conventional illumination at 0.9 sigma will be standard, while a commercial option will offer 6 additional discrete settings for off-axis illumination which maintain high productivity.

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