"It's been a privilege to be a part of the EUV story – it's a collaborative effort on a truly grand scale. In my view, our EUV systems are the most complex machines in the world today."
Leon Levasier is appreciated inside and outside ASML as an overlay expert making a substantial contribution to the realization of the overlay roadmap for lithography systems.
The combination of Leon’s system knowledge and ability to come up with practical solutions enables him to also make an impact beyond the overlay roadmap as an expert in overall lithography scanner design.
Get to know Leon
ASML employee since 1997
Named a Fellow in 2011
Based in Veldhoven, the Netherlands
TWINSCAN dual-stage metrology design
System (overlay) performance impact of scanner system design and tolerances through extensive knowledge of scanner module and design
Holds 23 US patents across 21 ASML patent families